Novel approaches to implement the self-aligned spacer double-patterning process toward 11-nm node and beyondYAEGASHI, Hidetami; OYAMA, Kenichi; YABE, Kazuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720B.1-79720B.7, 2Conference Paper

Implementation of Double Patterning process toward 22-nm nodeYAEGASHI, Hidetami; NISIMURA, Eiichi; YABE, Kazuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75201E.1-75201E.9Conference Paper

The Important Challenge to Extend Spacer DP process towards 22nm and beyondOYAMA, Kenichi; NISIMURA, Eiichi; YAMAJI, Tomohito et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763907.1-763907.6, 2Conference Paper